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Muramatsu, Hisakazu*; Yoshikawa, K.*; *; *; Miura, Taichi*; Watanabe, Satoshi; Koizumi, Mitsuo; Osa, Akihiko; Sekine, Toshiaki
JAERI-Review 99-025, TIARA Annual Report 1998, p.211 - 213, 1999/10
no abstracts in English
*; *; *; *; *; *; Muto, Suguru*; Koizumi, Mitsuo; Osa, Akihiko; Sekine, Toshiaki; et al.
Journal of Radioanalytical and Nuclear Chemistry, 239(2), p.251 - 255, 1999/00
Times Cited Count:0 Percentile:0.01(Chemistry, Analytical)no abstracts in English
*; *; *; *; *; *; *; *; Muto, Suguru*; Koizumi, Mitsuo; et al.
Physical Review B, 58(17), p.11313 - 11321, 1998/11
Times Cited Count:5 Percentile:32.42(Materials Science, Multidisciplinary)no abstracts in English
*; *; *; *; *; *; Koizumi, Mitsuo; Osa, Akihiko; Sekine, Toshiaki; *; et al.
KURRI-TR, 0, p.102 - 106, 1996/02
no abstracts in English
*; *; *; Miura, Taichi*; Koizumi, Mitsuo; Osa, Akihiko; Sekine, Toshiaki; *; *; *; et al.
Hyperfine Interactions (C), p.396 - 399, 1996/01
no abstracts in English
Saeki, Masakatsu; Nakada, Masami; ; Nakamura, Akio
SIF Conf. Proc., Vol. 50 (ICAME-95), 0, p.119 - 122, 1996/00
no abstracts in English
Saeki, Masakatsu; Nakada, Masami;
Journal of Nuclear Science and Technology, 31(8), p.864 - 866, 1994/08
Times Cited Count:1 Percentile:26.96(Nuclear Science & Technology)no abstracts in English